We have compiled a list of manufacturers, distributors, product information, reference prices, and rankings for Resistance heating deposition equipment.
ipros is IPROS GMS ・ IPROS One of the largest technical database sites in Japan that collects information on.

Resistance heating deposition equipment Product List and Ranking from 4 Manufacturers, Suppliers and Companies | IPROS GMS

Resistance heating deposition equipment Product List

1～5 item / All 5 items

Displayed results
3-source resistance heating vapor deposition device

3-source resistance heating vapor deposition device

Equipped with an EB source expansion port! Compatible with 4-inch substrates, it features a substrate heating mechanism and a film thickness control mechanism!

This product is a three-source switchable resistance heating vapor deposition device aimed at metal materials. The square chamber improves maintainability. It supports 4-inch substrates and is equipped with a substrate heating mechanism and a film thickness control mechanism. 【Features】 ■ Substrate dimensions: 100×100 ■ Substrate heating temperature: Normal use 600℃ ■ Substrate rotation holder ■ Quartz film thickness gauge ■ EB source expansion port included ■ Resistance heating source: 100A three-source switchable *For more details, please refer to the PDF document or feel free to contact us.

  • Evaporation Equipment
  • Resistance heating deposition equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Resistance Heating Vapor Deposition Device DH300HD

Resistance Heating Vapor Deposition Device DH300HD

Scalability, operability, and safety are as robust as in the SD type.

The DH300HD (G/M) is a high-grade type equipped with a low-noise magnetic levitation TMP, designed to prevent contamination of the TMP by arranging the main angle valve and roughing line, allowing for sample exchange without stopping the pump. Additionally, it comes standard with a deposition monitor, enabling more precise film thickness control and automatic film formation.

  • others
  • Resistance heating deposition equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Multi-purpose vacuum deposition device with resistance heating deposition source.

Multi-purpose vacuum deposition device with resistance heating deposition source.

Resistance heating evaporation source for the multi-purpose vacuum deposition device HEX system.

This is a resistance heating evaporation source for the multi-purpose vacuum deposition device HEX/HEX-L. The resistance heating evaporation method is the most common vacuum deposition process. Materials are placed in a boat-type or crucible-type heating container, and by passing current through the heating container, resistance heat is generated to heat the materials. Once the temperature of the heating container rises sufficiently, the materials inside begin to evaporate. The deposition rate can be controlled by the current. The advantage of the resistance heating evaporation device is that it does not use process gases. Therefore, it operates at high vacuum levels, resulting in deposited films containing very few impurities. The TES source is fixed to the chamber with four butterfly nuts. Additionally, the cooling water piping is connected via quick-release connectors, allowing for quick replenishment of materials or replacement of boats/filaments. Up to five TES sources can be installed on the HEX, and up to six on the HEX-L. They can also be used in combination with the sputter source Fission, the electron beam evaporation source TAU, and the organic evaporation source ORCA.

  • Sputtering Equipment
  • Resistance heating deposition equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
2D resistance heating vapor deposition device

2D resistance heating vapor deposition device

The vapor deposition source is of the boat type! The substrate is mounted on a plate on a support, and the height can be changed as desired.

The "2D Resistance Heating Vapor Deposition Device" is a system that allows for the easy vapor deposition of two materials using resistance heating. The deposition source is of the boat type, and the substrate is mounted on a plate supported by pillars, with adjustable height. The exhaust system utilizes both DP and RP, enabling high vacuum to be achieved in a short time. 【Features】 - The SUS upper chamber is equipped with two CF70 ports and two 50mm windows, while the lower chamber comes standard with six CF70 ports. - The upper chamber has a mechanism for vertical movement powered by electricity. - It comes standard with a film thickness gauge and can also operate in a gas atmosphere. - It allows for the easy vapor deposition of two different materials. *For more details, please refer to the external link page or feel free to contact us.

  • Evaporation Equipment
  • Resistance heating deposition equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Resistance Heating Vapor Deposition Device DH300SD

Resistance Heating Vapor Deposition Device DH300SD

The standard specification is for a resistance heating evaporation source type, with SDG being a glass bell jar and SDM being a metal bell jar (both manual handling).

The DH300SD (G/M) is a general-purpose compact deposition system that incorporates a deposition source into a φ300 bell-jar type high vacuum exhaust device equipped with a fast-rising wide-band TMP. It is designed with an emphasis on initial cost performance and is structured as a system with scalability for a wide range of applications, including research and development and pilot production in fields such as semiconductors, optics, and electronic components.

  • others
  • Resistance heating deposition equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
IPROS Services
COPYRIGHT © 2001-2026 IPROS CORPORATION ALL RIGHTS RESERVED.